Объем воздуха одной единицы составляет ≥1500 м3/ч, поддерживает управление связью с несколькими единицами, быстро удаляет пыль и ЛОС в мастерской по покраске, соответствуя стандартам чистоты автомобильной промышленности.
Brief: Discover the BFU Bottom-Access FFU, an easy-maintenance HEPA system designed for hospital ORs and microelectronics labs. Featuring a compact, vibration-free design, this FFU offers 360 m³/h airflow with ultra-low turbulence, perfect for ISO Class 4-6 clean zones.
Related Product Features:
Durable galvanized aluminum box with baked-paint diffuser for corrosion resistance.
MRJH® motor and metal impeller ensure stable airflow and ultra-low noise.
Three-speed adjustable wind speed (0.45-0.75 m/s ±3%) for flexible cleanroom needs.
H13 HEPA filter achieves 99.99% efficiency at 0.3μm particles.
Bottom-detachable design simplifies maintenance and filter replacement.
Optional flange connections (D=25mm) and group control modules for system integration.
Engineered for low noise operation (46-55 dB ±5 dB) at 1.5m below the filter.
Compact 620x620x350mm footprint integrates seamlessly into space-constrained ceilings.
ЧаВо:
How does the bottom-access design simplify HEPA filter maintenance in sterile environments like ORs?
The tool-free, bottom-loading mechanism allows single-person filter replacement without dismantling the unit or disrupting laminar airflow, critical for maintaining ISO Class 5 conditions during surgeries or microelectronics production.
What makes this FFU suitable for vibration-sensitive applications like semiconductor metrology?
Featuring a brushless DC motor with G2.5 dynamic balance and <3µm vibration levels, it eliminates interference with sensitive equipment (e.g., electron microscopes or lithography tools) while operating at <50dB.
Can the compact 620x620x350mm frame integrate with existing cleanroom grids?
Yes, it supports drop-in installation for standard 2'x2' T-bar ceilings, flange-less sealing to prevent particle leakage, and optional adapters for ISO 14644-1 recertification.